EUV-Source

The EUV radiation is generated by a laser-based plasma source. The system can be used both for metrology, e.g. for characterization of EUV optics and sensoric devices, or for fundamental investigations on material interaction.

EUV-Source

 

EUV-Source schema
The EUV emitting plasma is produced with the help of a Nd:YAG laser that is focused into a pulsed gas jet (xenon or oxygen)
Specifications:  
Wavelength (Xe) 7 – 20 nm
Pulse length
 6 ns
Plasma shape
 Ø = 300 μm
Stability 10%